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New semiconductor etching process achieves five-fold speed improvement

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
Yahoo

After 20 years of research, DirectDrive plasma etching tech to transform chip making

Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...
AZOM

Experimenting with Spontaneous and Plasma Si Etching

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

Deep Reactive Ion Etch Equipment Market Expands Rapidly as Chipmakers Prioritize Yield Optimization and Process Precision | Valuates Reports

The Global Semiconductor Etch Equipment Market revenue was USD 22730 Million in 2022 and is forecast to a readjusted size of USD 49330 Million by 2029 with a CAGR of 11.2% during the forecast period ...
Nature

Plasma Etching and Atomic Layer Etching Processes

Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
EurekAlert!

Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors has been developed for the first time in the world

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
AZOM

Advancements in Plasma Etching and Deposition Processes for Compound Semiconductor Materials Applications

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Science Daily

Scientist uncovers physics behind plasma-etching process

A team of physicists has uncovered some of the physics that make possible the etching of silicon computer chips, which power cell phones, computers, and a huge range of electronic devices. Physicist ...
Nanowerk

New metrology for tuning the etch rate uniformity in plasma etch processes

(Nanowerk News) Imec and KLA Tencor have established a metrology method for optimizing the etch rate uniformity (ERU) in a transformer coupled plasma (TCP) reactor. The proposed metrology method makes ...
Business Wire

Roll-To-Roll Plasma-Etching Creates Nanostructures For Favorable-Cost Modification Of High-Area Polymer Films With Anti-Reflective Properties

DRESDEN, Germany--(BUSINESS WIRE)--Rain, darkness, the dazzling lights of an oncoming car - strong light reflection in such situations can be irritating or even become dangerous. Effective ...
Science Daily

Non-plasma high-speed anisotropic diamond etching with nickel in 1000°C water vapor

Development of next-generation power devices is needed for energy saving in a low carbon society. Diamond is a potentially important power device material due to its excellent physical and electronic ...
Nanowerk

Scientist uncovers physics behind plasma-etching process

(Nanowerk News) Physicist Igor Kaganovich at the Department of Energy's (DOE) Princeton Plasma Physics Laboratory (PPPL) and collaborators have uncovered some of the physics that make possible the ...