Nonthermal and thermal plasmas are used in the industrial, engineering, medical, and research industries. Plasma composition is an important parameter in any plasma process. Using optical emission ...

To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be studied in greater detail. By investigating new approaches to making digital ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

“Plasma” refers to a gas with a significant proportion of ionized molecules, which produce various excited ions, atoms, and molecules. Electrons liberated from ions and atoms are highly energetic and ...

In circuitry, etching is used to remove the deformed layer created during the grinding and polishing of metal components by selective chemical attack. Now, a research group at Nagoya University in ...

In today's industries, quality inspection in semiconductor manufacturing is critical. Many traditional fault detection and diagnosis techniques have been developed to determine the existence of trends ...

Multiple innovations in semiconductor processing are needed to enable 3D NAND bit density increases of about 30% per year at ever-decreasing cost per bit, all of which will be required to meet the ...

Demand for high power devices is increasing in several electronics applications, including automotive, industrial, data center, and energy industries. Today, power devices have to meet stringent ...